Improvement of Extraction Efficiency of OLED by Nanosphere Lithography

Fabrication of nanopillars by nanosphere lithography

A low cost nanosphere lithography method for patterning and generation of semiconductor nanostructures provides a potential alternative to the conventional top-down fabrication techniques. Forests of silicon pillars of sub-500 nm diameter and with an aspect ratio up to 10 were fabricated using a combination of the nanosphere lithography and deep reactive ion etching techniques. The nanosphere e...

Tunable multiband metasurfaces by moiré nanosphere lithography.

Moiré nanosphere lithography (MNSL), which features the relative in-plane rotation between two layers of self-assembled monodisperse nanospheres as masks, provides a cost-effective approach for creating moiré patterns on generic substrates. In this work, we experimentally and numerically investigate a series of moiré metasurfaces by MNSL. Due to the variety of gradient plasmonic nanostructures ...

Moiré Nanosphere Lithography.

We have developed moiré nanosphere lithography (M-NSL), which incorporates in-plane rotation between neighboring monolayers, to extend the patterning capability of conventional nanosphere lithography (NSL). NSL, which uses self-assembled layers of monodisperse micro/nanospheres as masks, is a low-cost, scalable nanofabrication technique and has been widely employed to fabricate various nanopart...

assessment of the efficiency of s.p.g.c refineries using network dea

data envelopment analysis (dea) is a powerful tool for measuring relative efficiency of organizational units referred to as decision making units (dmus). in most cases dmus have network structures with internal linking activities. traditional dea models, however, consider dmus as black boxes with no regard to their linking activities and therefore do not provide decision makers with the reasons...

Nanosphere Lithography for Nitride Semiconductors